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2025-07-14
In recent years, the expansion of global silicon wafer production capacity has shown an accelerating trend, which is particularly significant in 2024.
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Silicon carbide (SiC), as the core material of the third-generation semiconductor, has been playing an increasingly important role in the semiconductor industry in recent years.
Atomic-level polishing technology has made significant progress in the field of semiconductor manufacturing, successfully reducing the surface roughness of silicon wafers to a new limit of 0.1nm.
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